heyburns-PortraitUtils/docs/StitchByMask.md

Stitch by Mask

PortraitStitchPreview blends two images with a mask and a typed Edit & Composite Config. The old unconfigured StitchByMask interface has been removed.

Inputs

• image_a: Base/background image, retained where the mask is black.
• image_b: Replacement image, selected where the mask is white.
• edit_config: Required PORTRAIT_EDIT_CONFIG_V2 bundle.
• opacity_source: Use blend_opacity or stitch_opacity from the bundle.
• mask: Required unless bypass_mask is enabled.
• invert_mask: Reverse mask coverage.
• bypass_mask: Blend the whole image using the selected opacity.
• feather_radius: Expand/feather mask coverage in processing pixels.
• force_size: Resize both images and the mask to the target width/height.
• target_width, target_height: Used only when force_size is enabled.

With force_size off, the images must share dimensions and the mask must match. No metadata input/output is provided by this node.

Outputs

• stitched: Composited image.
• processed_mask: Mask used for the blend, for inspection/downstream use.

The production node uses the corrected 2.0 compositor: it applies opacity once after feathering, returns a standard BHW mask, and handles RGBA safely. The StitchByMask and StitchByMaskV2 IDs have been removed. See the replacement details.

See Typed Workflow Configuration for the edit bundle.